Kobe, Japan

Tadashi Shimazu

USPTO Granted Patents = 8 

 

Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Hyogo, JP (2008)
  • Tokyo, JP (2014)
  • Takasago, JP (2014)
  • Kobe, JP (2011 - 2015)

Company Filing History:


Years Active: 2008-2015

Loading Chart...
Loading Chart...
8 patents (USPTO):Explore Patents

Title: Innovations of Tadashi Shimazu

Introduction

Tadashi Shimazu is a prominent inventor based in Kobe, Japan. He has made significant contributions to the field of plasma processing, holding a total of 8 patents. His work focuses on improving the efficiency and effectiveness of plasma processing methods and apparatuses.

Latest Patents

One of his latest patents is a plasma processing apparatus and plasma processing method. This invention aims to reduce plasma damage during processing. The apparatus supplies an inert gas to the process chamber while adjusting pressure fluctuations to a prescribed range. By controlling plasma power, the density of plasma in the transfer area of the substrate is minimized, ensuring safe handling of the substrate. Another notable patent is a method and apparatus for producing a silicon nitride film. This invention addresses the issue of blister generation at the periphery of a substrate during the formation of a silicon nitride film through bias power application.

Career Highlights

Tadashi Shimazu has worked with notable companies such as Mitsubishi Heavy Industries Limited and Mitsubishi Electric Corporation. His experience in these organizations has contributed to his expertise in plasma processing technologies.

Collaborations

Throughout his career, he has collaborated with esteemed colleagues, including Masahiko Inoue and Ryuichi Matsuda. These collaborations have further enhanced his innovative capabilities and contributions to the field.

Conclusion

Tadashi Shimazu's work in plasma processing has led to significant advancements in the industry. His inventions continue to influence the development of efficient processing methods and apparatuses.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…