Tadashi Shimazu

This inventor holds 8 USPTO granted patents and 3 published patent applications and 3 EPO patents. Top assignees: Mitsubishi Heavy Industries Limited, Mitsubishi Electric Corporation. Active years: 2008-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tadashi Shimazu. Retrieved from https://idiyas.com/inventor/tadashi-shimazu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 8 (Patent Applications = 3)

% Patents Active = 12.5

EPO Patents = 3 (Patent Applications = 3)

Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 7(Granted Patents)

Location History:

Hyogo, JP (2008)
Tokyo, JP (2014)
Takasago, JP (2014)
Kobe, JP (2011 - 2015)

Company Filing History:

8 out of 4,746

Mitsubishi Heavy Industries Limited

patents

1 out of 16,602

Mitsubishi Electric Corporation

patents

where one patent can have more than one assignee

Years Active: 2008-2015

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8 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9011634 - Plasma processing apparatus and plasma processing method (2015-04-21),

2. 8889568 - Method and apparatus for producing silicon nitride film (2014-11-18),

3. 8662010 - Plasma processing apparatus, plasma processing method, plasma film deposition apparatus, and plasma film deposition method (2014-03-04),

4. 8480912 - Plasma processing apparatus and plasma processing method (2013-07-09),

5. 8337960 - Seasoning method for film-forming apparatus (2012-12-25),

6. 8288294 - Insulating film for semiconductor device, process and apparatus for producing insulating film for semiconductor device, semiconductor device, and process for producing the semiconductor device (2012-10-16),

7. 7972946 - Plasma treatment method and plasma treatment device (2011-07-05),

8. 7314525 - Plasma CVD apparatus (2008-01-01),

Title: Innovations of Tadashi Shimazu

Introduction

Tadashi Shimazu is a prominent inventor based in Kobe, Japan. He has made significant contributions to the field of plasma processing, holding a total of 8 patents. His work focuses on improving the efficiency and effectiveness of plasma processing methods and apparatuses.

Latest Patents

One of his latest patents is a plasma processing apparatus and plasma processing method. This invention aims to reduce plasma damage during processing. The apparatus supplies an inert gas to the process chamber while adjusting pressure fluctuations to a prescribed range. By controlling plasma power, the density of plasma in the transfer area of the substrate is minimized, ensuring safe handling of the substrate. Another notable patent is a method and apparatus for producing a silicon nitride film. This invention addresses the issue of blister generation at the periphery of a substrate during the formation of a silicon nitride film through bias power application.

Career Highlights

Tadashi Shimazu has worked with notable companies such as Mitsubishi Heavy Industries Limited and Mitsubishi Electric Corporation. His experience in these organizations has contributed to his expertise in plasma processing technologies.

Collaborations

Throughout his career, he has collaborated with esteemed colleagues, including Masahiko Inoue and Ryuichi Matsuda. These collaborations have further enhanced his innovative capabilities and contributions to the field.

Conclusion

Tadashi Shimazu's work in plasma processing has led to significant advancements in the industry. His inventions continue to influence the development of efficient processing methods and apparatuses.

Profile summary based on public USPTO records.