The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2014
Filed:
May. 04, 2007
Ryuichi Matsuda, Takasago, JP;
Tadashi Shimazu, Takasago, JP;
Masahiko Inoue, Kobe, JP;
Mitsubishi Heavy Industries, Ltd., Tokyo, JP;
Abstract
A plasma film deposition apparatus (plasma processing apparatus) includes a second antennadisposed around an antennaand located outwardly of a ceiling surface. The second antennais supplied with an electric current flowing in a direction opposite to the direction of an electric current supplied to the antennaby a power supply. Lines of magnetic force F, heading in a direction opposite to the direction of lines of magnetic force Fappearing at the site of the antenna, are thereby generated at the site of the second antenna. Thus, the magnetic flux density in the direction of the wall surface is lowered, even when a uniform plasma is generated over a wide range within a tubular container