The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2012
Filed:
Feb. 19, 2007
Tadashi Shimazu, Kobe, JP;
Yuichi Kawano, Takasago, JP;
Tadashi Shimazu, Kobe, JP;
Yuichi Kawano, Takasago, JP;
Mitsubishi Heavy Industries, Ltd., Tokyo, JP;
Abstract
A seasoning method for a film-forming apparatus configured to form a silicon nitride film on a substrate placed in a process chamber. The method is conducted for reducing particles in the apparatus. The method comprises executing the plasma cleaning of the process chamber to remove a film deposited on the inner wall thereof (step S), subsequently depositing an amorphous silicon film (step S), depositing thereon a silicon nitride film in which the nitrogen content gradually increases in the thickness direction (step S), and keeping the inside of the process chamber being filled with a rare-gas plasma until film formation on the substrate is initiated (step S).
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile