Takasago, Japan

Yuichi Kawano



Average Co-Inventor Count = 2.8

ph-index = 2

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2008-2015

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4 patents (USPTO):Explore Patents

Title: Innovations of Yuichi Kawano

Introduction

Yuichi Kawano is a notable inventor based in Takasago, Japan. He has made significant contributions to the field of plasma processing technology. With a total of 4 patents to his name, Kawano continues to push the boundaries of innovation in his industry.

Latest Patents

Kawano's latest patents include a plasma processing apparatus and a plasma processing method. The plasma processing apparatus is designed to reduce particles generated due to the inner potential of an inner cylinder within a vacuum container. This apparatus features a metal vacuum chamber and an inner cylinder made of surface-alumited aluminum, which disposes a substrate in a plasma diffusion region for effective plasma processing. Additionally, the apparatus includes protruding portions that make point-contact with the vacuum chamber, ensuring electrical connectivity between the inner cylinder and the vacuum chamber.

Another significant patent is the seasoning method for a film-forming apparatus. This method is aimed at forming a silicon nitride film on a substrate placed in a process chamber. The process involves plasma cleaning the chamber to remove any deposited film, followed by the deposition of an amorphous silicon film and a silicon nitride film with gradually increasing nitrogen content. The method ensures that the process chamber is filled with rare-gas plasma until film formation begins.

Career Highlights

Kawano is currently employed at Mitsubishi Heavy Industries Limited, where he applies his expertise in plasma processing technologies. His work has been instrumental in advancing the capabilities of film-forming apparatuses and improving the efficiency of plasma processing methods.

Collaborations

Throughout his career, Kawano has collaborated with esteemed colleagues such as Ryuichi Matsuda and Masahiko Inoue. These collaborations have fostered innovation and contributed to the development of cutting-edge technologies in their field.

Conclusion

Yuichi Kawano's contributions to plasma processing technology exemplify his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in plasma processing and film formation. Kawano's work continues to influence the industry and inspire future advancements.

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