The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2015
Filed:
May. 24, 2010
Ryuichi Matsuda, Takasago, JP;
Kazuto Yoshida, Kobe, JP;
Yuichi Kawano, Takasago, JP;
Mitsubishi Heavy Industries, Ltd., Tokyo, JP;
Abstract
Provided are a plasma processing apparatus and a plasma processing method wherein particles generated due to the inner potential of an inner cylinder disposed inside of a vacuum container are reduced. The plasma processing apparatus has, inside of a metal vacuum chamber (), the inner cylinder () composed of a surface-alumited aluminum, disposes a substrate in a plasma diffusion region, and performs plasma processing. A plurality of protruding portions () in point-contact with the vacuum chamber () are provided on the lower end portion of the inner cylinder (), the alumite film () on the leading end portion () of each of the protruding portion () is removed, and the inner cylinder and the vacuum chamber () are electrically connected to each other.