The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2013
Filed:
Feb. 15, 2007
Ryuichi Matsuda, Takasago, JP;
Masahiko Inoue, Kobe, JP;
Kazuto Yoshida, Kobe, JP;
Tadashi Shimazu, Kobe, JP;
Ryuichi Matsuda, Takasago, JP;
Masahiko Inoue, Kobe, JP;
Kazuto Yoshida, Kobe, JP;
Tadashi Shimazu, Kobe, JP;
Mitsubishi Heavy Industries, Ltd., Tokyo, JP;
Abstract
Provided are a plasma processing apparatus and a plasma processing method, by which plasma damage is reduced during processing. At the time of performing desired plasma processing to a substrate (), a process chamber () is supplied with an inert gas for carrying in and out the substrate (), pressure fluctuation in the process chamber () is adjusted to be within a prescribed range, and plasma () of the inert gas supplied in the process chamber () is generated. The density of the plasma () in the transfer area of the substrate () is reduced by controlling plasma power to be in a prescribed range, and the substrate () is carried in and out to and from a supporting table ().