Koshi, Japan

Tadashi Nishiyama

This inventor holds 25 USPTO granted patents and 1 published patent application, primarily in Substrate Inspection Technology. Top assignee: Tokyo Electron Limited. Active years: 1989-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tadashi Nishiyama. Retrieved from https://idiyas.com/inventor/tadashi-nishiyama-x0fi20lm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 25 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 28(Granted Patents)


Location History:

  • Yokohama, JP (1989)
  • Koshi, JP (2011 - 2023)
  • Kumamoto, JP (2023)

Company Filing History:


Years Active: 1989-2026

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Areas of Expertise:
Substrate Inspection
Imaging Apparatus
Defect Analysis
Coating Film
Treatment Method
Sensitivity Adjustment
Film Thickness Measurement
Pattern Recognition
Storage Medium
Defect Inspection
Processing Apparatus
25 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Tadashi Nishiyama

Introduction

Tadashi Nishiyama, an esteemed inventor based in Koshi, Japan, has made significant contributions to the field of substrate inspection technology. With an impressive portfolio of 19 patents, he continues to push the boundaries of innovation at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment sector.

Latest Patents

Nishiyama's recent patents focus on advanced substrate inspection methods and apparatuses. One notable patent describes a substrate inspection device that utilizes a sophisticated acquisition part to generate estimated images of inspection target substrates post-processing. By employing a machine learning model, it assesses substrates based on images captured before and after processing. The invention's determination part enhances defect detection, providing manufacturers with a reliable solution for quality assurance. Another of his inventions is the substrate imaging apparatus, which includes a rotary holding unit designed to rotate substrates while utilizing a mirror member and a specialized camera to capture images, enabling comprehensive analysis of substrate conditions.

Career Highlights

Tadashi Nishiyama's career at Tokyo Electron Limited has been marked by continuous innovation and a commitment to enhancing inspection methodologies. His expertise enables the development of state-of-the-art equipment that meets the ever-evolving demands of the semiconductor industry. With each innovative patent, Nishiyama has contributed to technological advancements that improve both efficiency and accuracy in manufacturing processes.

Collaborations

Throughout his career, Nishiyama has collaborated with talented professionals, including his colleagues Hiroshi Tomita and Kazuya Hisano. Their combined efforts in research and development have led to significant breakthroughs in substrate inspection technologies, reinforcing the importance of teamwork in achieving groundbreaking results.

Conclusion

Tadashi Nishiyama exemplifies the spirit of innovation within the semiconductor sector. Through his extensive work at Tokyo Electron Limited and his patent contributions, he has played a pivotal role in enhancing substrate inspection methods. As technology continues to advance, his findings and inventions will undoubtedly inspire future developments in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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