The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2023

Filed:

May. 31, 2018
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Takuya Mori, Tokyo, JP;

Tadashi Nishiyama, Koshi, JP;

Akiko Kiyotomi, Koshi, JP;

Hiroshi Tomita, Koshi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/38 (2006.01); G03F 7/20 (2006.01); G05B 19/042 (2006.01); H01L 21/67 (2006.01); G03F 7/34 (2006.01); G03F 7/16 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G05B 19/042 (2013.01); G03F 7/20 (2013.01); G03F 7/34 (2013.01); G03F 7/38 (2013.01); H01L 21/67225 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G05B 2219/2602 (2013.01); H01L 21/027 (2013.01);
Abstract

This method includes a step of imaging, by an imaging apparatus in a substrate treatment system, a reference substrate which is a reference for condition setting and acquiring a captured image of the reference substrate; and a step of imaging, by the imaging apparatus, a treated substrate on which the predetermined treatment has been performed under a current treatment condition and acquiring a captured image of the treated substrate. A deviation amount in color information between the captured image of the treated substrate and the captured image of the reference substrate is calculated. A correction amount of the treatment condition is calculated based on a correlation model acquired in advance and on the deviation amount in the color information. Also included is a step of setting the treatment condition based on the correction amount and performing the treatment on a target substrate based on the set treatment condition.


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