Koshi, Japan

Akiko Kiyotomi

USPTO Granted Patents = 12 

Average Co-Inventor Count = 1.9

ph-index = 1

Forward Citations = 6(Granted Patents)


Location History:

  • Koshi, JP (2016 - 2023)
  • Kumamoto, JP (2021 - 2023)

Company Filing History:


Years Active: 2016-2025

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12 patents (USPTO):Explore Patents

Title: Akiko Kiyotomi: Innovator in Substrate Treatment Technologies

Introduction

Akiko Kiyotomi is a prominent inventor based in Koshi, Japan. She has made significant contributions to the field of substrate treatment technologies, holding a total of 12 patents. Her innovative work focuses on improving the efficiency and accuracy of substrate processing systems.

Latest Patents

Among her latest patents is a treatment condition setting method, storage medium, and substrate treatment system. This method involves acquiring images of both a reference substrate and a treated substrate to calculate a deviation amount in information. Based on this deviation, a correction amount for the treatment condition is determined, allowing for the setting of a second treatment condition for optimal processing. Another notable patent is a substrate inspection apparatus, which includes a storage for inspection image data, an edge detector for identifying target edges, and a width calculator for measuring the distance between the theoretical periphery of the substrate and the target edge.

Career Highlights

Akiko Kiyotomi has established herself as a key figure in her field through her innovative patents and contributions to substrate treatment technologies. Her work has been instrumental in advancing the capabilities of substrate processing systems, making them more efficient and reliable.

Collaborations

She collaborates with notable colleagues such as Tadashi Nishiyama and Kazuya Hisano, contributing to a dynamic and innovative work environment at her company.

Conclusion

Akiko Kiyotomi's contributions to substrate treatment technologies exemplify her dedication to innovation and excellence in her field. Her patents reflect her commitment to advancing technology and improving processes in substrate treatment systems.

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