Tokyo, Japan

Tadashi Fukase


Average Co-Inventor Count = 1.1

ph-index = 5

Forward Citations = 77(Granted Patents)


Company Filing History:


Years Active: 1995-2001

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8 patents (USPTO):Explore Patents

Title: Innovations by Tadashi Fukase in Semiconductor Technology

Introduction

Tadashi Fukase is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on improving the manufacturing processes of semiconductor devices, which are crucial for modern electronics.

Latest Patents

Fukase's latest patents include a method of manufacturing a semiconductor device. This method involves forming MOS transistors on a semiconductor substrate, which includes impurity diffusion regions and a gate electrode. A first interlayer insulating film is deposited over the MOS transistors, and contact holes are opened to reach the impurity diffusion regions. A conductor is then deposited on the entire surface of the semiconductor substrate and etched back to form contact plugs only in the contact holes. Additionally, pad portions are formed on the contact plugs using a selective growth method. Another notable patent relates to the formation of a gate electrode, where first and second oxides are formed on a substrate's surface. The invention ensures that the polysilicon film is planarized at a level that prevents excessive etching while maintaining fabrication efficiency.

Career Highlights

Fukase is currently employed at NEC Corporation, a leading company in the technology sector. His innovative approaches have significantly advanced semiconductor manufacturing techniques, making him a valuable asset to his organization.

Collaborations

Fukase has collaborated with notable coworkers, including Takehiko Hamada and Masahiro Komuro. Their combined expertise has contributed to the successful development of various semiconductor technologies.

Conclusion

Tadashi Fukase's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in electronics and manufacturing processes.

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