Company Filing History:

14 out of 35,734

Nec Corporation

Years Active: 1991-2015

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23 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9209245 - Semiconductor device having plural patterns extending in the same direction (2015-12-08),

2. 8994151 - Semiconductor device having plural patterns extending in the same direction (2015-03-31),

3. 7955761 - Exposure mask, pattern formation method, and exposure mask fabrication method (2011-06-07),

4. 7923179 - Exposure mask and pattern forming method therefor (2011-04-12),

5. 7910266 - Pattern forming method and mask (2011-03-22),

6. 7810066 - Irradiation pattern data generation method, mask fabrication method, and plotting system (2010-10-05),

7. 7691543 - Mask data creation method (2010-04-06),

8. 7681173 - Mask data generation method and mask (2010-03-16),

9. 7632614 - Circuit pattern exposure method and mask (2009-12-15),

10. 6355382 - Photomask and exposure method using a photomask (2002-03-12),

11. 6150059 - Photomask and method of exposure using same (2000-11-21),

12. 6004699 - Photomask used for projection exposure with phase shifted auxiliary (1999-12-21),

13. 5935738 - Phase-shifting mask, exposure method and method for measuring amount of (1999-08-10),

14. 5908718 - Phase shifting photomask with two different transparent regions (1999-06-01),

15. 5827623 - Optical proximity correction halftone type phase shift photomask (1998-10-27),

Title: Profile of Inventor Tadao Yasuzato: A Visionary in Semiconductor Technology

Introduction: Tadao Yasuzato, based in Tokyo, Japan, is a distinguished inventor known for his significant contributions to semiconductor technology. With a remarkable portfolio of 23 patents, Yasuzato has made strides in the field that continue to influence the industry.

Latest Patents: Among Tadao Yasuzato's latest innovations is a semiconductor device featuring multiple patterns extending in the same direction. This innovative design utilizes a photomask that includes a mask blank and a sophisticated light shielding film. The light shielding film is notable for its plurality of opening traces that extend in a first direction. Moreover, the ends of the first and second opening traces are positioned differently in this same direction, while the second opening trace adjoins the first, showcasing Yasuzato's adeptness at optimizing photomask technologies.

Career Highlights: Tadao Yasuzato's professional journey includes key roles at notable companies such as NEC Corporation and Elpida Memory, Inc. His work at these organizations has been instrumental in advancing semiconductor devices and production techniques.

Collaborations: Throughout his career, Yasuzato has collaborated with esteemed colleagues, including Shinji Ishida and Nobue Kosa. These partnerships have not only enriched his work but also propelled the collective efforts toward breakthroughs in semiconductor technology.

Conclusion: Tadao Yasuzato stands as a luminary in the semiconductor industry, with a robust patent portfolio and a history of impactful collaborations. His inventive spirit and dedication to advancing technology continue to shape the future of electronics, making him a significant figure in innovation.

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