The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7910266 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 22, 2011

Filed:

Aug. 05, 2008
Applicant:

Tadao Yasuzato, Tokyo, JP;

Inventor:

Tadao Yasuzato, Tokyo, JP;

Assignee:

Elpida Memory, Inc., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Hole patterns are repeatedly arranged on a mask at a constant pitch in each of predetermined directions. In the predetermined directions, a first direction with the smallest pitch and a second direction with the second smaller pitch are specified. A Levenson phase shifter is formed corresponding to the hole patterns to cause the phases of transmitted light through the hole patterns adjacent to each other in the first direction to be opposite to each other. An exposure process is performed by two-point illumination which is adapted to improve the resolution property in the second direction.


Find Patent Forward Citations

Yasuzato, Tadao. (2011). Pattern forming method and mask (U.S. Patent No. 7910266). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7910266

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…