The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2015
Filed:
Feb. 13, 2015
Applicant:
Ps4 Luxco S.a.r.l., Luxembourg, LU;
Inventor:
Tadao Yasuzato, Tokyo, JP;
Assignee:
PS4 Luxco S.a.r.l., Luxembourg, LU;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 21/768 (2006.01); G03F 1/00 (2012.01); G03F 1/50 (2012.01); H01L 23/50 (2006.01); H01L 27/108 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0657 (2013.01); G03F 1/00 (2013.01); G03F 1/50 (2013.01); H01L 21/768 (2013.01); H01L 21/76816 (2013.01); H01L 23/50 (2013.01); H01L 27/108 (2013.01); H01L 29/06 (2013.01);
Abstract
A photomask has a mask blank and a light shielding film formed on the mask blank. The light shielding film includes a plurality of opening traces extending in a first direction. An end of a first opening trace in the first direction and an end of a second opening trace in the first direction are in different positions in the first direction. The second opening trace adjoins the first opening trace.