This inventor holds 24 USPTO granted patents and 9 published patent applications, primarily in Display Technology. Top assignees: Au Optronics Corporation, Auo Corporation. Active years: 2007-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Tungshiau Jen, TW (2008)
- Miaoli, TW (2007 - 2009)
- Miaoli County, TW (2009 - 2012)
- Hsinchu, TW (2010 - 2014)
- Hsinchu County, TW (2009 - 2016)
Company Filing History:
Years Active: 2007-2026
Areas of Expertise:
Title: Innovations by Ta-Wen Liao: A Leader in Photolithography Technology
Introduction
Ta-Wen Liao, a prominent inventor based in Hsinchu, Taiwan, has made significant contributions to the field of photolithography. With a portfolio of 20 patents, Liao has pushed the boundaries of technology, particularly in the area of patterned layer formation which is essential for advanced semiconductor manufacturing.
Latest Patents
Liao's latest innovations include several cutting-edge patents that focus on methods related to the formation of patterned layers and photoresist layers. Notable among them is an exposure apparatus designed for exposing a photoresist layer. This apparatus integrates a light source, a specialized lens group, and a mask. The lens group consists of multiple strip lenses that operate in parallel, facilitating the creation of numerous strip exposed patterns. Additionally, the corresponding mask features various shielding patterns, each designed with strip openings that align with the overall exposure strategy, showcasing Liao's advanced understanding of photolithographic processes.
Career Highlights
Currently, Ta-Wen Liao is associated with AU Optronics Corporation, a major player in the display technology industry. His work not only underscores his technical acumen but also aligns with the company’s commitment to innovation in the fields of display and imaging technology. Liao’s accomplishments exemplify a remarkable fusion of theory and practical application, making him a respected figure in his industry.
Collaborations
Throughout his career, Liao has collaborated with notable colleagues such as Hsiang-Chih Hsiao and Han-Tu Lin. These partnerships highlight the importance of teamwork and the sharing of insights in pioneering advancements within complex technological domains. Such collaborations often lead to multifaceted innovations that can significantly influence industry standards.
Conclusion
Ta-Wen Liao's contributions to the field of photolithography continue to shape the landscape of modern technology. With his innovative patents and collaborative efforts, he plays a vital role in enhancing the efficiency and effectiveness of semiconductor manufacturing processes. His work is not just a reflection of individual brilliance but also an illustration of how innovation thrives within a community of dedicated professionals.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile