The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2010
Filed:
Jan. 22, 2008
Han-tu Lin, Hsinchu, TW;
Chih-chun Yang, Hsinchu, TW;
Ming-yuan Huang, Hsinchu, TW;
Chih-hung Shih, Hsinchu, TW;
Ta-wen Liao, Hsinchu, TW;
Chia-chi Tsai, Hsinchu, TW;
Han-Tu Lin, Hsinchu, TW;
Chih-Chun Yang, Hsinchu, TW;
Ming-Yuan Huang, Hsinchu, TW;
Chih-Hung Shih, Hsinchu, TW;
Ta-Wen Liao, Hsinchu, TW;
Chia-Chi Tsai, Hsinchu, TW;
Au Optronics Corporation, Hsinchu, TW;
Abstract
A method for fabricating a pixel structure using a laser ablation process is provided. This fabrication method forms a gate, a channel layer, a source, a drain, a passivation layer, and a pixel electrode sequentially by using a laser ablation process. Particularly, the fabrication method is not similar to a photolithography and etching process, so as to reduce the complicated photolithography and etching processes, such as spin coating process, soft-bake, hard-bake, exposure, developing, etching, and stripping. Therefore, the fabrication method simplifies the process and thus reduces the fabrication cost.