Sungho Jo

Title: Sungho Jo: Innovator in Microelectronic Device Technology

Introduction

Sungho Jo is a notable inventor based in Chestnut Hill, MA (US). He has made significant contributions to the field of microelectronics, holding a total of 3 patents. His work primarily focuses on enhancing the performance and reliability of microelectronic devices through innovative processes.

Latest Patents

One of his latest patents is a plasma treatment process to densify oxide layers. This method involves forming an oxide layer containing silicon oxide and having an initial wet etch rate (WER) over features disposed on the substrate. The process includes exposing the oxide layer to a first plasma treatment to produce a treated oxide layer, followed by a second plasma treatment to create a densified oxide layer with a final WER of less than one-half of the initial WER. Another significant patent involves etch rate modulation through ion implantation. This method aims to increase the etch resistivity of the hard mask by implanting an etch rate modifying species into the hard mask after the mask etching process is completed. This innovation helps preserve the integrity of the mask during subsequent etching processes.

Career Highlights

Sungho Jo has worked with prominent companies in the semiconductor industry, including Varian Semiconductor Equipment Associates, Inc. and Applied Materials, Inc. His experience in these organizations has allowed him to develop and refine his innovative techniques in microelectronics.

Collaborations

Throughout his career, Sungho Jo has collaborated with talented professionals, including Kyu-Ha Shim and Rajesh Prasad. These collaborations have contributed to the advancement of technology in the field.

Conclusion

Sungho Jo's contributions to microelectronic device technology through his patents and collaborations highlight his role as an influential inventor. His innovative approaches continue to shape the industry and improve device performance.