Sung-Mu Hsu

Title: Innovator Spotlight: Sung-Mu Hsu

Introduction

Sung-Mu Hsu is a prominent inventor based in I-Lan, Taiwan, recognized for his contributions in the field of photomask technology. With a total of eight patents to his name, Hsu has made significant advancements that enhance the quality and efficiency of photomasks used in semiconductor manufacturing.

Latest Patents

Among Hsu's latest innovations is a multi-phase mask utilizing multi-layer thin films. This invention presents a multi-layer multi-phase phase shifting photomask and outlines a method for its fabrication. The design of this photomask employs several phase shifting layers, each providing less than a 180° optical phase shift. This configuration enables a total optical phase shift of 180°, enhancing image quality by creating a gradual transition from no phase shift to a 180° phase shift at the edges of the patterns.

Another noteworthy invention by Hsu is the non-absorbing anti-reflective coated reticle using thin dielectric materials. This anti-reflective reticle consists of a patterned metal layer established on a transparent substrate, topped by a two-layer dielectric stack. The layers work together to eliminate undesired reflections, improving the efficacy of the photomask during the fabrication process.

Career Highlights

Hsu is currently affiliated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on developing cutting-edge technologies that streamline manufacturing processes and enhance product performance.

Collaborations

Hsu has collaborated with notable colleagues such as Ling Chen and Chia-Shiung Tsai. Together, they have contributed to innovative solutions that address complex challenges in semiconductor manufacturing, driving advancements in the industry.

Conclusion

Sung-Mu Hsu's inventive spirit and dedication to improvement in photomask technology have established him as a significant figure in the field. His contributions, evidenced by his patents, reflect his commitment to excellence in semiconductor manufacturing, ensuring high-quality outcomes for various applications in technology.