The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 1999
Filed:
Jun. 07, 1996
Applicant:
Inventors:
Assignee:
Taiwan Semiconductor Manufacturing Company Ltd., Hsin-Chu, TW;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438694 ; 438756 ;
Abstract
This invention relates to a method for protecting regions of a spin-on-glass(SOG) layer, which covers usable semiconductor dice, from dissolution damage during an etch step which removes SOG along the wafer edge. The endangered dice have portions which lie in the area affected by the edge rinse. Instead of performing the edge etching step immediately after the deposition of the SOG, the endangered dice are first selectively partially cured by exposure to ultraviolet radiation. This makes the SOG over these dice resistant to the SOG solvent used for the edge rinse. Up to ten percent of the total usable dice on the wafer can be salvaged by the method of this invention.