The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2001
Filed:
Sep. 30, 1998
Jung-Hsien Hsu, Hsin-Chu, TW;
Sung-Mu Hsu, I-Lan, TW;
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Abstract
This invention provides a multi-layer multi-phase phase shifting photomask and a method for fabricating the same. The photomask of this invention uses a number of phase shifting layers each layer providing less than 180°optical phase shift to provide a total optical phase shift of 180°. The multi-layer multi-phase phase shifting photomask provides a gradual transition form no phase shift to 180° phase shift at pattern edges thereby improving image quality. The patterns in the layers of phase shifting material are formed using non critical etching steps. The thickness of the phase shifting layers is controlled by the deposition of the layers of phase shifting material which is relatively easy to control.