Company Filing History:
Years Active: 1997-2001
Title: Inventor Profile: Jung-hsien Hsu
Introduction
Jung-hsien Hsu is a prominent inventor based in Hsin-Chu, Taiwan. He has contributed significantly to the field of semiconductor technology and holds a total of six patents. His innovative work primarily focuses on improving the fabrication processes in semiconductor devices, which is crucial for enhancing performance and reliability.
Latest Patents
Hsu's recent patents demonstrate his expertise and creativity in the semiconductor industry. One of his notable inventions is the "Enhanced structure for salicide MOSFET," which describes a method for increasing salicide thickness and effective polysilicon width at a narrow polysilicon line. This invention addresses the critical issue of resistance reduction and minimizes the risk of source/drain bridging during the fabrication of silicided polysilicon gates. The detailed process involves various layers of polysilicon, dielectric materials, and the strategic removal of layers to achieve an optimal structure.
Another significant patent is the "Multi-phase mask using multi-layer thin films." This invention introduces a multi-layer multi-phase phase-shifting photomask that improves image quality by providing a gradual transition from no phase shift to 180° phase shift at pattern edges. The method for fabricating this photomask relies on non-critical etching steps, which ensures better control over the thickness of the phase-shifting layers.
Career Highlights
Jung-hsien Hsu has established himself as a valuable asset in Taiwan Semiconductor Manufacturing Company Limited (TSMC), where he utilizes his innovative spirit to drive advancements in semiconductor technologies. His work has led to notable improvements in the manufacturing processes, impacting the efficiency and performance of various electronic devices.
Collaborations
Throughout his career, Hsu has collaborated with several talented professionals in the field, including his colleagues Chung-Kuang Lee and Pi-Shan Wang. Together, they have shared insights and expertise, contributing to the successful development of multiple groundbreaking technologies in the semiconductor industry.
Conclusion
Jung-hsien Hsu's contributions to semiconductor innovations highlight his commitment to advancing technology through inventive solutions. With his extensive patent portfolio and collaborative efforts, he continues to make significant strides in the field, shaping the future of semiconductor manufacturing and performance.