Sudeep Pallikkara Kuttiatoor

Title: Sudeep Pallikkara Kuttiatoor: Innovator in Chemical-Mechanical Polishing

Introduction

Sudeep Pallikkara Kuttiatoor is a notable inventor based in Aurora, IL (US). He has made significant contributions to the field of chemical-mechanical polishing, holding a total of 4 patents. His work focuses on developing innovative polishing compositions that enhance the efficiency and selectivity of substrate polishing processes.

Latest Patents

Sudeep's latest patents include a self-stopping polishing composition and method for high topological selectivity. This invention provides a chemical-mechanical polishing composition that comprises an abrasive selected from ceria and zirconia, a self-stopping agent, a nonionic polymer, a cationic monomer compound, and water. The polishing composition is designed to have a pH of about 5.5 to about 8, making it particularly effective for substrates containing silicon oxide and polysilicon.

Another significant patent focuses on CMP compositions selective for oxide and nitride with improved dishing and pattern selectivity. This invention includes a ceria abrasive, a polyhydroxy aromatic carboxylic acid, an ionic polymer, and water, with a pH of about 1 to about 4.5. This composition is tailored for substrates that contain silicon oxide, silicon nitride, and/or polysilicon, enhancing the precision of the polishing process.

Career Highlights

Throughout his career, Sudeep has worked with prominent companies in the industry, including Cabot Microelectronics Corporation and CMC Materials, Inc. His experience in these organizations has allowed him to refine his expertise in chemical-mechanical polishing technologies.

Collaborations

Sudeep has collaborated with notable professionals in his field, including Renhe Jia and Kevin P. Dockery. These collaborations have contributed to the advancement of polishing technologies and the development of innovative solutions.

Conclusion

Sudeep Pallikkara Kuttiatoor is a distinguished inventor whose work in chemical-mechanical polishing has led to significant advancements in the industry. His innovative patents and collaborations reflect his commitment to enhancing substrate polishing processes.