The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2024
Filed:
Dec. 21, 2021
Cmc Materials, Inc., Aurora, IL (US);
Juyeon Chang, Bolingbrook, IL (US);
Sudeep Pallikkara Kuttiatoor, Naperville, IL (US);
Sajo Naik, Naperville, IL (US);
Elliot Knapton, Aurora, IL (US);
Jinfeng Wang, Naperville, IL (US);
Michael Willhoff, Naperville, IL (US);
CMC Materials LLC, Aurora, IL (US);
Abstract
The invention provides a chemical-mechanical polishing composition comprising: (a) an abrasive selected from a ceria abrasive, a zirconia abrasive, and a combination thereof; (b) a self-stopping agent selected from a compound of formula (I), (c) optionally a nonionic polymer; (d) a cationic monomer compound; and (e) water, wherein the polishing composition has a pH of about 5.5 to about 8. The invention also provides a method of chemically-mechanically polishing a substrate, especially a substrate comprising silicon oxide and optionally polysilicon, using said composition.