The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2026
Filed:
Oct. 22, 2020
Applicant:
Cmc Materials, Inc., Aurora, IL (US);
Inventors:
Steven Kraft, Elgin, IL (US);
Fernando Hung Low, Naperville, IL (US);
Sudeep Pallikkara Kuttiatoor, Naperville, IL (US);
Sarah Brosnan, St. Charles, IL (US);
Brian Reiss, Woodridge, IL (US);
Sajo Naik, Naperville, IL (US);
Assignee:
CMC Materials LLC, Aurora, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); B24B 37/04 (2012.01); C09K 3/14 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); B24B 37/044 (2013.01); C09K 3/1409 (2013.01);
Abstract
A chemical mechanical polishing composition for polishing a substrate having a silicon oxygen material includes a liquid carrier, cubiform ceria abrasive particles dispersed in the liquid carrier, and an organic diacid.