Sarah Brosnan

Title: The Innovative Journey of Sarah Brosnan

Introduction

Sarah Brosnan, an accomplished inventor based in St. Charles, IL, has made significant contributions to the field of chemical mechanical polishing (CMP). With a total of six patents to her name, she continues to push the boundaries of innovation in substrate polishing technologies.

Latest Patents

Among her notable inventions is a patented composition and method for polysilicon CMP. This innovative chemical mechanical polishing composition incorporates a water-based liquid carrier, a silica abrasive, and a polysilicon polishing accelerator derived from either amino acid or guanidine derivatives. Designed for effective substrate polishing, this composition maintains a pH range from about 10 to about 11 and minimizes the presence of tetraalkylammonium salt to less than about 500 ppm.

Another of her recent patents involves the development of a polishing pad employing polyamine and cyclohexanedimethanol curatives. This thermosetting polyurethane polishing layer includes a carefully balanced molar ratio of polyamine to cyclohexanedimethanol curative, ranging from about 20:1 to about 1:1, optimizing its performance in chemical-mechanical polishing applications.

Career Highlights

Throughout her career, Sarah has worked with prestigious companies such as Cabot Microelectronics Corporation and CMC Materials, Inc. Her experience in these leading firms has contributed to her understanding of the intricate technologies involved in CMP and has laid the foundation for her successful inventions.

Collaborations

Sarah has collaborated with numerous talented individuals, including her coworkers Alexander W. Hains and Juyeon Chang. These partnerships have enriched her work and fostered an environment of collective innovation, driving advancements in polishing technologies.

Conclusion

Sarah Brosnan's journey as an inventor showcases her passion for innovation and her dedication to advancing the field of chemical mechanical polishing. With her impressive portfolio of patents and her commitment to collaboration, she continues to inspire future generations of inventors and researchers in the technology sector.