The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2023
Filed:
Jul. 08, 2020
Applicant:
Cabot Microelectronics Corporation, Aurora, IL (US);
Inventors:
Rui Ma, Aurora, IL (US);
Lin Fu, Rancho Palos Verdes, CA (US);
Chen-Chih Tsai, Naperville, IL (US);
Jaeseok Lee, Beaverton, OR (US);
Sarah Brosnan, St. Charles, IL (US);
Assignee:
CMC MATERIALS, INC., Aurora, IL (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 37/24 (2012.01);
U.S. Cl.
CPC ...
B24B 37/24 (2013.01);
Abstract
A chemical-mechanical polishing pad comprising a thermosetting polyurethane polishing layer includes an isocyanate-terminated urethane prepolymer, a polyamine curative, and a cyclohexanedimethanol curative. The polyamine curative and the cyclohexanedimethanol curative are in a molar ratio of polyamine curative to cyclohexanedimethanol curative in a range from about 20:1 to about 1:1.