Fernando Hung Low

Title: Innovations of Inventor Fernando Hung Low in Chemical-Mechanical Polishing

Introduction

Fernando Hung Low is an accomplished inventor based in Aurora, IL, United States. With a total of five patents to his name, he has made significant contributions to the field of chemical-mechanical polishing, particularly in advancements related to silicon nitride substrates and carbon-based films.

Latest Patents

Among his latest inventions is a patented **Chemical-Mechanical Polishing Composition for Silicon Nitride CMP**. This innovation provides a specialized composition for polishing silicon nitride-containing substrates. The formulation includes an aqueous carrier along with cationic silica particles that exhibit a zeta potential of at least 10 mV. Additionally, it comprises polishing additives such as polyether amine, polysilamine, and polyvinylimidazole, with a pH level exceeding 6.

Another notable patent is for a **Silica-Based Slurry for Selective Polishing of Carbon-Based Films**. This invention offers a chemical-mechanical polishing composition that incorporates a silica abrasive, a surfactant, an iron cation, and water. The silica abrasive presents a negative zeta potential, enhancing the polishing process for substrates with carbon-based films.

Career Highlights

Fernando Hung Low has had an impressive career, working with prominent companies in the industry, including CMC Materials, Inc. and Cabot Microelectronics Corporation. His experience at these organizations has allowed him to develop and refine his innovative methodologies in the realm of chemical-mechanical polishing.

Collaborations

Throughout his career, Fernando has collaborated with talented individuals, notably including Roman A. Ivanov and Steven Kraft. Their partnerships have likely contributed to the advancement of their respective projects and innovations in the field.

Conclusion

Fernando Hung Low exemplifies the innovative spirit of inventors who continuously push the boundaries of technology. With his significant contributions to chemical-mechanical polishing, he remains a vital figure in the industry, paving the way for new techniques and developments.