Location History:
- Halifax, MA (US) (2016)
- Woodridge, IL (US) (2011 - 2023)
Company Filing History:
16 out of 297 
3 out of 33 
3 out of 832,680 Years Active: 2011-2025
Title: Exploring the Innovations of Brian Reiss
Introduction
Brian Reiss, an inventive mind based in Woodridge, IL, has made significant contributions to the field of chemical engineering, particularly in the area of chemical-mechanical polishing (CMP). With an impressive portfolio of 21 patents, Reiss has developed innovative solutions that enhance the efficiency and effectiveness of substrate polishing processes.
Latest Patents
Among his latest patents, the first noteworthy invention is a composition and method for polysilicon CMP. This unique chemical mechanical polishing composition is specifically designed for polishing substrates that include a polysilicon layer. The innovative formula comprises a water-based liquid carrier, a silica abrasive, and an amino acid or guanidine derivative that acts as a polishing accelerator, along with an alkali metal salt. Notably, this composition contains less than about 500 ppm of tetraalkylammonium salt and maintains a pH in the range of approximately 10 to 11.
Another remarkable patent by Reiss is the development of a silica-based slurry for the selective polishing of carbon-based films. This invention outlines a chemical-mechanical polishing composition that includes a silica abrasive, surfactants, an iron cation, and potentially other ligands, all combined with water. The silica abrasive in this composition has a negative zeta potential, which plays a critical role in the polishing method of substrates with carbon-based films.
Career Highlights
Reiss has built a substantial career in the innovation sector, having worked with prominent companies such as Cabot Microelectronics Corporation. His extensive experience in the industry has allowed him to hone his skills in developing patents that meet the needs of modern semiconductor manufacturing processes.
Collaborations
Throughout his career, Brian Reiss has worked closely with notable colleagues, including Michael L. White and Lamon Jones. These partnerships have significantly influenced his work and contributed to the advancements in chemical-mechanical polishing technologies.
Conclusion
Brian Reiss stands out as a leading inventor in the field of chemical engineering, with his pioneering patents playing a vital role in the evolution of chemical-mechanical polishing techniques. His dedication and innovative spirit continue to push the boundaries of technology, making a lasting impact on the industry.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.