The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2016
Filed:
Jan. 17, 2012
Brian Reiss, Woodridge, IL (US);
John Clark, Pflugerville, TX (US);
Lamon Jones, Aurora, IL (US);
Michael White, Ridgefield, CT (US);
Brian Reiss, Woodridge, IL (US);
John Clark, Pflugerville, TX (US);
Lamon Jones, Aurora, IL (US);
Michael White, Ridgefield, CT (US);
Cabot Microelectronics Corporation, Aurora, IL (US);
Abstract
The invention relates to a chemical-mechanical polishing composition comprising silica, one or more tetraalkylammonium salts, one or more bicarbonate salts, one or more alkali metal hydroxides, one or more aminophosphonic acids, one or more rate accelerator compounds, one or more polysaccharides, and water. The polishing composition reduces surface roughness and PSD of polished substrates. The invention further relates to a method of chemically-mechanically polishing a substrate, especially a silicon substrate, using the polishing composition described herein.