Pflugerville, TX, United States of America

John Clark

USPTO Granted Patents = 6 


Average Co-Inventor Count = 4.7

ph-index = 2

Forward Citations = 8(Granted Patents)


Location History:

  • Montgomery, IL (US) (2012 - 2014)
  • Rio Rancho, NM (US) (2014)
  • Pflugerville, TX (US) (2014 - 2017)

Company Filing History:


Years Active: 2012-2017

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6 patents (USPTO):Explore Patents

Title: John Clark: Innovator in Silicon Polishing Technologies

Introduction

John Clark is a notable inventor based in Pflugerville, TX (US), recognized for his contributions to the field of silicon polishing technologies. With a total of 6 patents to his name, Clark has made significant advancements that enhance the efficiency and effectiveness of silicon polishing processes.

Latest Patents

Among his latest patents, Clark has developed a composition and method for polishing bulk silicon. This invention provides a polishing composition that includes silica, compounds that increase the removal rate of silicon, tetraalkylammonium salts, and water, with a pH ranging from about 7 to about 11. Additionally, he has created a silicon polishing composition with improved particle size distribution (PSD) performance. This chemical-mechanical polishing composition comprises silica, tetraalkylammonium salts, bicarbonate salts, alkali metal hydroxides, aminophosphonic acids, rate accelerator compounds, polysaccharides, and water. The invention aims to reduce surface roughness and PSD of polished substrates, particularly silicon substrates.

Career Highlights

Throughout his career, John Clark has worked with prominent companies, including Cabot Microelectronics Corporation. His work has significantly impacted the semiconductor industry, particularly in the development of advanced polishing techniques.

Collaborations

Clark has collaborated with notable professionals in his field, including Brian Reiss and Michael L. White. These collaborations have contributed to the innovation and refinement of his patented technologies.

Conclusion

John Clark's innovative work in silicon polishing technologies has established him as a key figure in the industry. His patents reflect a commitment to improving the efficiency and quality of silicon substrates, making a lasting impact on semiconductor manufacturing.

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