Aalen, Germany

Stefan Krone

USPTO Granted Patents = 9 

 

Average Co-Inventor Count = 3.5

ph-index = 2

Forward Citations = 23(Granted Patents)


Location History:

  • Dresden, DE (2006 - 2016)
  • Aalen, DE (2015 - 2021)

Company Filing History:


Years Active: 2006-2021

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9 patents (USPTO):Explore Patents

Title: The Innovations of Stefan Krone

Introduction

Stefan Krone is a notable inventor based in Aalen, Germany, recognized for his contributions to the field of lithography systems. With a total of nine patents to his name, he has made significant advancements in control devices and components for projection exposure apparatuses.

Latest Patents

Among his latest patents is a control device for actuating an actuator unit of a lithography system. This innovative control device is designed to set the position of an optical element within the lithography system. It features an amplifier unit that provides a control signal for the actuator unit through both a voltage signal and a PWM signal. The PWM signal is characterized by a duty factor and a clock frequency, with the clock frequency being an integer multiple of a basic clock frequency that ranges from 10 kHz to 1 MHz. Another significant patent involves a component for a projection exposure apparatus, which includes a printed circuit board housed in an encapsulated structure. This component is equipped with electronic parts and a heat conducting structure that effectively dissipates heat to the outer side of the housing.

Career Highlights

Stefan Krone has worked with prominent companies such as Carl Zeiss SMT GmbH and Vodafone Holding GmbH. His experience in these organizations has contributed to his expertise in developing advanced technologies in the field of lithography and electronic components.

Collaborations

Throughout his career, Stefan has collaborated with notable colleagues, including Lars Berger and Jan Horn. These partnerships have likely fostered innovation and the exchange of ideas in their respective projects.

Conclusion

Stefan Krone's work exemplifies the spirit of innovation in the field of lithography systems and electronic components. His patents reflect a commitment to advancing technology and improving the efficiency of complex systems.

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