Company Filing History:

10 out of 131,214

Samsung Electronics Co., Ltd.

patents

1 out of 2,607

Korea Advanced Institute of Science and Technology

patents

where one patent can have more than one assignee

Years Active: 2003-2014

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10 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8715914 - Organometallic composition for forming a metal alloy pattern and a method of forming such a pattern using the composition (2014-05-06),

2. 7883838 - Organometallic composition for forming a metal alloy pattern and a method of forming such a pattern using the composition (2011-02-08),

3. 7084288 - Organometallic precursor for forming metal film or pattern and method of forming metal film or pattern using the same (2006-08-01),

4. 7033738 - Process of forming a micro-pattern of a metal or a metal oxide (2006-04-25),

5. 7014979 - Organometallic precursor mixture for forming metal alloy pattern and method of forming metal alloy pattern using the same (2006-03-21),

6. 6965045 - Organic metal precursor for use in forming metal containing patterned films (2005-11-15),

7. 6923923 - Metallic nanoparticle cluster ink and method for forming metal pattern using the same (2005-08-02),

8. 6774034 - Organometallic precursor for forming metal pattern and method of forming metal pattern using the same (2004-08-10),

9. 6620971 - Asymmetric &bgr;-ketoiminate ligand compound, preparation method thereof, and organometal percursor comprising the same (2003-09-16),

10. 6599587 - Organometallic precursor for forming metal pattern and method of forming metal pattern using the same (2003-07-29),

Title: **Innovative Contributions of Soon Taik Hwang in Organometallic Composition Technology**

Introduction

Soon Taik Hwang is a prominent inventor based in Kyungki-do, South Korea, recognized for his significant contributions to the field of organometallic compositions. With a portfolio boasting ten patents, Hwang has made extensive advancements in the development of metal alloy patterns, which have crucial applications in modern electronic devices.

Latest Patents

Among his latest innovations is the patent for an organometallic composition designed for forming a metal alloy pattern. This composition includes an organometallic compound containing silver, as well as additional organometallic compounds that incorporate elements such as gold, palladium, or ruthenium. The specific composition promotes the presence of metal components in precise molar percentages, which allows for enhanced heat resistance, adhesiveness, and chemical stability in the resultant silver alloy patterns. His method simplifies the manufacturing process and is particularly applicable in creating reflective films for LCDs and metal wiring in flexible displays and flat panel displays. Additionally, it extends to CMP-free damascene processing and PR-free ITO film deposition, showcasing Hwang's keen insight into the industry needs.

Career Highlights

Soon Taik Hwang's professional journey includes significant tenures at esteemed organizations such as Samsung Electronics Co., Ltd., and the Korea Advanced Institute of Science and Technology. His role in these institutions allowed him to refine his expertise and contribute to groundbreaking research in material science and semiconductor technologies.

Collaborations

Throughout his career, Hwang has collaborated closely with talented colleagues like Euk Che Hwang and Young Hun Byun. These partnerships have not only fostered innovation but have also built a strong support network of experts committed to pushing the boundaries of current technological possibilities.

Conclusion

Soon Taik Hwang stands out as a pivotal figure in the field of organometallic compositions, with his innovative patents driving advancements in electronic manufacturing processes. His work continues to influence industry standards and practices, paving the way for new technologies in an ever-evolving marketplace.

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