The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2006
Filed:
Jan. 03, 2003
Applicants:
Young Hun Byun, Daejun-Shi, KR;
Soon Taik Hwang, Daejun-Shi, KR;
Euk Che Hwang, Daejun-Shi, KR;
Seok Chang, Daejun-Shi, KR;
Inventors:
Young Hun Byun, Daejun-Shi, KR;
Soon Taik Hwang, Daejun-Shi, KR;
Euk Che Hwang, Daejun-Shi, KR;
Seok Chang, Daejun-Shi, KR;
Assignee:
Samsung Electronics Co., Ltd., Kyungki Do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A rapid and efficient process of forming a metal-containing pattern by producing, through photoreaction, a difference in solubility between exposed and unexposed areas of a thing film, and developing the film to produce a patterned film, followed by oxidation or reduction to provide a pure metal or metal oxide pattern.