The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 08, 2011

Filed:

Nov. 24, 2003
Applicants:

Jin Young Kim, Gyeonggi-Do, KR;

Soon Taik Hwang, Gyeonggi-Do, KR;

Young Hun Byun, Daejeon-Shi, KR;

Euk Che Hwang, Gyeonggi-Do, KR;

Sang Yoon Lee, Seoul, KR;

Inventors:

Jin Young Kim, Gyeonggi-Do, KR;

Soon Taik Hwang, Gyeonggi-Do, KR;

Young Hun Byun, Daejeon-Shi, KR;

Euk Che Hwang, Gyeonggi-Do, KR;

Sang Yoon Lee, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 31/12 (2006.01); C08F 4/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

An organometallic composition containing an organometallic compound (I) containing Ag, an organometallic compound (II) containing Au, Pd, or Ru, and an organometallic compound (III) containing Ti, Ta, Cr, Mo, Ru, Ni, Pd, Cu, Au, or Al, wherein the metal components of organometallic compounds (II) and (III), respectively, are present in an amount of 0.01˜10 mol % based on the amount of Ag in the organometallic compound (I), and a method of forming a metal alloy pattern using the same. Silver alloy patterns can be obtained through a simplified manufacturing process, which patterns have enhanced heat resistance, adhesiveness and chemical stability. The method may be applied to making a reflective film for LCD and metal wiring (gate, source, drain electrode) for flexible displays or flat panel displays, and further to CMP-free damascene processing and PR-free ITO film deposition.


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