Song-Yuan Chang

Title: Innovations and Contributions of Inventor Song-Yuan Chang

Introduction

Song-Yuan Chang, a prolific inventor located in Taoyuan, Taiwan, has made significant contributions to the field of chemical mechanical polishing (CMP) and material sciences. With a remarkable tally of 13 patents, he is recognized for his innovative approaches and solutions that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Among his latest patents, Song-Yuan Chang has developed a "System for Chemical Mechanical Polishing of Ge-based Materials and Devices." This patent describes a CMP slurry composition that provides high selectivity for Ge or SiGe over dielectric materials, significantly reducing the rate of Ge or SiGe recess formation. The formulation includes an oxidant and a germanium removal rate enhancer, which may feature methylpyridine compounds and their derivatives. Additionally, the slurry may incorporate various agents like an abrasive, surfactant, organic complexant, or etching inhibitors, aimed at further enhancing polishing efficiency.

Another notable patent is the "Method of Selectively Removing Tungsten Over Silicon Oxide," which presents a slurry composition comprising abrasive particles, halogen oxide, and nitroxide compounds. This unique combination demonstrates a synergistic effect, facilitating the selective removal of tungsten from substrates containing silicon oxide, thereby optimizing the polishing process in semiconductor fabrication.

Career Highlights

Throughout his career, Song-Yuan Chang has worked at esteemed companies such as Uwiz Technology Co., Ltd. and Taiwan Semiconductor Manufacturing Company Limited. His experience at these organizations has allowed him to apply his inventive concepts practically, contributing to advancements in semiconductor technologies.

Collaborations

Collaboration is key to innovation, and Song-Yuan Chang has worked alongside notable professionals, including coworkers Yun-Lung Ho and Ming-Hui Lu. Their combined expertise has led to notable improvements in chemical mechanical polishing techniques, paving the way for future innovations in semiconductor processing.

Conclusion

Song-Yuan Chang stands out as a significant figure in the realm of semiconductor technology, driven by his passion for invention and expertise in material sciences. His 13 patents reflect a dedication to enhancing manufacturing methodologies, especially in the processing of Ge-based materials and tungsten. As the semiconductor industry continues to evolve, the impact of Chang's innovations will undoubtedly resonate in future developments.