The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2015

Filed:

Aug. 07, 2012
Applicants:

Wei-jung Chen, Tainan, TW;

Wen-tsai Tsai, Taipei, TW;

Ho-ying Wu, New Taipei, TW;

Song-yuan Chang, Chiayi County, TW;

Ming-hui LU, Taipei, TW;

Inventors:

Wei-Jung Chen, Tainan, TW;

Wen-Tsai Tsai, Taipei, TW;

Ho-Ying Wu, New Taipei, TW;

Song-Yuan Chang, Chiayi County, TW;

Ming-Hui Lu, Taipei, TW;

Assignee:

UWIZ Technology Co., Ltd., Taoyuan County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/461 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); C09K 13/00 (2006.01); C09K 13/06 (2006.01); C09G 1/02 (2006.01); C23F 3/04 (2006.01); H01L 21/321 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); C23F 3/04 (2013.01); H01L 21/3212 (2013.01);
Abstract

Provided is a polishing slurry composition, including a non-ionic surfactant represented by the following formula (1)R—(OCHCH)—OH  formula (1)wherein x is an integer from 1 to 50, and R is selected from a group consisting of a C3-C50 alkyl group, a C6-C55 benzylalkyl group and a C6-C55 phenylalkyl group.


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