The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2010
Filed:
Feb. 27, 2009
Applicants:
Song-yuan Chang, Chia-Yi, TW;
Ming-hui LU, Taipei, TW;
Wen-jsai Jsai, Hsinchu, TW;
Po-yuan Shen, Taoyuan, TW;
Inventors:
Song-Yuan Chang, Chia-Yi, TW;
Ming-Hui Lu, Taipei, TW;
Wen-Jsai Jsai, Hsinchu, TW;
Po-Yuan Shen, Taoyuan, TW;
Assignee:
Uwiz Technology Co., Ltd., Taoyuan County, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 1/12 (2006.01); C11D 3/26 (2006.01); C11D 3/20 (2006.01); C11D 3/33 (2006.01);
U.S. Cl.
CPC ...
Abstract
An acidic post-CMP cleaning composition includes at least one polyamino-polycarboxylic acid, or salt thereof; at least one hydroxycarboxylic acid, or salt thereof; and the remainder being substantially water. The acidic cleaning composition also includes a surfactant. The acidic post-CMP cleaning composition has a pH of 1 to 5, and is useful for removing the contaminants from the wafer surface after a CMP process without making roughness worse.