Soichiro Arai

This inventor holds 21 USPTO granted patents, primarily in Charged Particle Beam Exposure. Top assignees: Fujitsu Corporation, Adv Antest Corporation. Active years: 1994-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Soichiro Arai. Retrieved from https://idiyas.com/inventor/soichiro-arai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 21

% Patents Active = 95.2

Average Co-Inventor Count = 6.7

ph-index = 13

Forward Citations = 422(Granted Patents)

Location History:

Tokyo, JP (2001)
Kawasaki, JP (1994 - 2003)

Company Filing History:

Adv Antest Corporation

patents

where one patent can have more than one assignee

Years Active: 1994-2003

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Areas of Expertise:

Charged Particle Beam

Exposure System

Exposure Method

High-Speed Exposure

Pattern Exposing

Electron Beam

Exposure Apparatus

Device Cleaning

Pattern Transfer

Exposure Device

Charged-Particle Beam

21 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6646275 - Charged particle beam exposure system and method (2003-11-11),

2. 6486479 - Charged particle beam exposure system and method (2002-11-26),

3. 6188074 - Charged particle beam exposure apparatus (2001-02-13),

4. 6118129 - Method and system for exposing an exposure pattern on an object by a (2000-09-12),

5. 6072185 - Charged-particle-beam exposure device and method capable of high-speed (2000-06-06),

6. 6064807 - Charged-particle beam exposure system and method (2000-05-16),

7. 6057907 - Method of and system for exposing pattern on object by charged particle (2000-05-02),

8. 5977548 - Charged particle beam exposure system and method (1999-11-02),

9. 5965895 - Method of providing changed particle beam exposure in which (1999-10-12),

10. 5920077 - Charged particle beam exposure system (1999-07-06),

11. 5910658 - Method and system for changed particle beam exposure (1999-06-08),

12. 5866300 - Method of and system for exposing pattern on object by charged particle (1999-02-02),

13. 5841145 - Method of and system for exposing pattern on object by charged particle (1998-11-24),

14. 5721432 - Method of and system for charged particle beam exposure (1998-02-24),

15. 5719402 - Method of and system for charged particle beam exposure (1998-02-17),

Title: The Innovative Journey of Soichiro Arai

Introduction: Soichiro Arai, a visionary inventor hailing from Kawasaki, Japan, has made significant contributions to the world of technology and innovation through his groundbreaking inventions.

Latest Patents: Soichiro Arai's latest patents focus on advancements in renewable energy technologies, particularly in the field of solar power generation and energy storage solutions.

Career Highlights: With a career spanning over two decades, Soichiro Arai has established himself as a leading figure in the tech industry. His innovative spirit and dedication to pushing the boundaries of what is possible have led to numerous successful inventions that have shaped the industry.

Collaborations: Throughout his career, Soichiro Arai has collaborated with top research institutions and leading tech companies to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: Soichiro Arai's passion for innovation and his relentless pursuit of excellence have cemented his legacy as a pioneering inventor in the field of technology. His contributions continue to inspire future generations of inventors to push the boundaries of what is possible.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]