The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2001

Filed:

Dec. 10, 1998
Applicant:
Inventors:

Takamasa Satoh, Tokyo, JP;

Soichiro Arai, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 3/7302 ;
U.S. Cl.
CPC ...
H01J 3/7302 ;
Abstract

A charged particle beam exposure apparatus of the BAA type is disclosed, which improves the transmission rate of at least a signal transmission path leading from a blanking aperture array (BAA) control circuit to at least a blanking electrode and has an increased BAA driving speed. The impedance of the signal transmission path leading from the driver of the BAA control circuit to the BAA electrode is rendered to coincide with the output impedance of the driver of the BAA control circuit. Further, an auxiliary transmission path is provided for leading the signal transmission path inside a column outside of the column, and terminates with a resistor having the same impedance with the transmission impedance, thereby matching the impedance of the signal transmission path.


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