The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 1999
Filed:
Feb. 12, 1998
Yoshihisa Oae, Kawasaki, JP;
Tomohiko Abe, Kawasaki, JP;
Soichiro Arai, Kawasaki, JP;
Shigeru Maruyama, Kawasaki, JP;
Hiroshi Yasuda, Kawasaki, JP;
Kenichi Miyazawa, Kawasaki, JP;
Junichi Kai, Kawasaki, JP;
Takamasa Satoh, Kawasaki, JP;
Keiichi Betsui, Kawasaki, JP;
Hideki Nasuno, Kasugai, JP;
Fujitsu Limited, Kanagawa, JP;
Abstract
A charged particle beam exposure method including the steps of creating dot pattern data indicative of a pattern to be exposed, storing the dot indicative of a pattern to be exposed, storing the dot pattern data in a first storage device having a first access speed, transferring the dot pattern data from the first storage device to a second storage device having a second, higher access speed, reading the dot pattern data out from the second storage device; and producing a plurality of charged particle beams in response to the dot pattern data read out from the second storage device by means of a blanking aperture array. The blanking aperture array includes a plurality of apertures each causing turning-on and turning-off of a changed particle beam pertinent to the aperture in response to the dot pattern data.