Location History:
- Sunnyvale, CA (US) (2002)
- San Jose, CA (US) (2003 - 2017)
- Santa Clara, CA (US) (2024)
Company Filing History:
Years Active: 2002-2025
Title: Innovations and Contributions of Siqing Lu in Semiconductor Technologies
Introduction: Siqing Lu, based in San Jose, CA, is a prominent inventor and engineer with a remarkable portfolio of 20 patents. His work primarily focuses on advancements in semiconductor processing technology, showcasing his commitment to innovation in the industry.
Latest Patents: Among his latest inventions, one notable patent is the "Deposition ring for thin substrate handling via edge clamping." This innovation encompasses a process kit designed for use in a process chamber, featuring a unique deposition ring with a dual-layered structure. The first portion of the ring maintains a position spaced from the second, allowing for precise alignment of inner ledges in a clamping configuration. Another significant patent is the "Cover ring for use in semiconductor processing chamber," which highlights further advancements in protecting and enhancing semiconductor processes.
Career Highlights: Siqing Lu has made substantial contributions to Applied Materials, Inc., a leading company in the semiconductor equipment manufacturing sector. His dedication to research and development has significantly impacted various technological solutions within the company. His innovative approach has earned him recognition for creating efficient and effective tools for semiconductor processing.
Collaborations: Collaboration is vital in the field of innovation, and Siqing Lu has worked alongside talented colleagues such as Yu Wen Chang and Qiwei Liang. Their joint efforts contribute to ongoing advancements in semiconductor technologies, reflecting the synergy present in their professional relationship.
Conclusion: Siqing Lu stands out as a key figure in the world of semiconductor innovations. His expertise and patent portfolio demonstrate his dedication to improving manufacturing processes. With continued contributions and collaborations, he is poised to make further impactful advancements in technology.