The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 26, 2010

Filed:

Aug. 11, 2005
Applicants:

Siqing LU, San Jose, CA (US);

Qiwei Liang, Fremont, CA (US);

Canfeng Lai, Fremont, CA (US);

Robert T. Chen, Fremont, CA (US);

Jason T. Bloking, Mountain View, CA (US);

Irene Chou, San Jose, CA (US);

Steven H. Kim, Union City, CA (US);

Young S. Lee, Santa Clara, CA (US);

Ellie Y. Yieh, San Jose, CA (US);

Inventors:

Siqing Lu, San Jose, CA (US);

Qiwei Liang, Fremont, CA (US);

Canfeng Lai, Fremont, CA (US);

Robert T. Chen, Fremont, CA (US);

Jason T. Bloking, Mountain View, CA (US);

Irene Chou, San Jose, CA (US);

Steven H. Kim, Union City, CA (US);

Young S. Lee, Santa Clara, CA (US);

Ellie Y. Yieh, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
Abstract

A substrate processing system has a housing that defines a process chamber, a gas-delivery system, a high-density plasma generating system, a substrate holder, and a controller. The housing includes a sidewall and a dome positioned above the sidewall. The dome has physically separated and noncontiguous pieces. The gas-delivery system introduces e a gas into the process chamber through side nozzles positioned between two of the physically separated and noncontiguous pieces of the dome. The high-density plasma generating system is operatively coupled with the process chamber. The substrate holder is disposed within the process chamber and supports a substrate during substrate processing. The controller controls the gas-delivery system and the high-density plasma generating system.


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