Irene Chou

Title: Irene Chou: Innovator in Plasma Reactor Technology

Introduction

Irene Chou is a prominent inventor based in San Jose, CA (US). She has made significant contributions to the field of plasma reactor technology, holding 2 patents that showcase her innovative spirit and technical expertise.

Latest Patents

Her latest patents include advancements in thermal management of inductively coupled plasma reactors. One patent describes an RF coil assembly that generates plasma inductively in a process chamber. This assembly features an RF coil positioned around the perimeter of the chamber, supported by a frame that maintains its position. An interface material with a thermal conductivity of 4.0 W/mK or greater is placed between the frame and the chamber's sidewall, enhancing thermal efficiency.

Another notable patent is for a two-piece dome with separate RF coils for inductively coupled plasma reactors. This substrate processing system includes a housing that defines a process chamber, a gas-delivery system, and a high-density plasma generating system. The dome consists of physically separated and noncontiguous pieces, allowing for effective gas introduction through side nozzles. The system is designed to optimize substrate processing, with a controller managing both the gas-delivery and plasma generating systems.

Career Highlights

Irene Chou is currently employed at Applied Materials, Inc., where she continues to push the boundaries of technology in her field. Her work has been instrumental in developing systems that enhance the efficiency and effectiveness of plasma reactors.

Collaborations

Irene collaborates with talented coworkers, including Siqing Lu and Qiwei Liang, who contribute to her innovative projects and research.

Conclusion

Irene Chou's contributions to plasma reactor technology exemplify her dedication to innovation and excellence. Her patents reflect her ability to solve complex engineering challenges and advance the field significantly.