Applied Materials, Inc.

Irene Chou

Ellie Y Yieh

Qiwei Liang

Young Seen Lee

Siqing Lu

Steven H Kim

Muhammad M Rasheed

Canfeng Lai

Jason T Bloking

Robert Chen

An RF coil assembly provides a source to generate a plasma inductively in a process chamber. The RF coil assembly includes an RF coil disposed about a perimeter of the processing chamber and a frame disposed about a perimeter of the processing chamber. The frame is adapted to support the RF coil in position. An interface material is disposed between and in thermal contact with the frame and a sidewall of the processing chamber. The interface material has a thermal conductivity of 4.0 W/mK or greater.

Thermal management of inductively coupled plasma reactors

A substrate processing system has a housing that defines a process chamber, a gas-delivery system, a high-density plasma generating system, a substrate holder, and a controller. The housing includes a sidewall and a dome positioned above the sidewall. The dome has physically separated and noncontiguous pieces. The gas-delivery system introduces e a gas into the process chamber through side nozzles positioned between two of the physically separated and noncontiguous pieces of the dome. The high-density plasma generating system is operatively coupled with the process chamber. The substrate holder is disposed within the process chamber and supports a substrate during substrate processing. The controller controls the gas-delivery system and the high-density plasma generating system.

Two-piece dome with separate RF coils for inductively coupled plasma reactors

Growing community of inventors

San Jose, CA, United States of America

Irene Chou