Company Filing History:
Years Active: 2005-2010
Title: The Innovative Contributions of Robert Chen
Introduction
Robert Chen is a notable inventor based in Fremont, CA, who has made significant contributions to the field of semiconductor processing. With a total of 5 patents to his name, Chen's work focuses on advancements in plasma processing technology, which is crucial for the manufacturing of semiconductor devices.
Latest Patents
One of Chen's latest patents is titled "Internal balanced coil for inductively coupled high density plasma processing chamber." This invention involves a coil designed for use in semiconductor processing systems to generate plasma with a magnetic field within a chamber. The coil consists of a first coil segment, a second coil segment, and an internal balance capacitor. The configuration allows for a voltage peak along the first coil segment to be substantially aligned with a virtual ground along the second coil segment.
Another significant patent is "Two-piece dome with separate RF coils for inductively coupled plasma reactors." This invention describes a substrate processing system that includes a housing defining a process chamber, a gas-delivery system, and a high-density plasma generating system. The dome of the housing is composed of physically separated and noncontiguous pieces, allowing for efficient gas introduction and plasma generation during substrate processing.
Career Highlights
Throughout his career, Robert Chen has worked with prominent companies such as Applied Materials, Inc. and Cisco Technology, Inc. His experience in these organizations has contributed to his expertise in semiconductor technology and plasma processing systems.
Collaborations
Chen has collaborated with talented individuals in his field, including Siqing Lu and Qiwei Liang. These collaborations have likely enhanced the innovation and development of his patented technologies.
Conclusion
Robert Chen's contributions to the field of semiconductor processing through his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry and pave the way for future developments in plasma processing systems.