The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 2024

Filed:

Nov. 18, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Abhishek Chowdhury, Bangalore, IN;

Edwin C. Suarez, Pleasanton, CA (US);

Harisha Sathyanarayana, Bangalore, IN;

Nataraj Bhaskar Rao, Bangalore, IN;

Siqing Lu, Santa Clara, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 14/00 (2006.01); C23C 14/34 (2006.01); C23C 14/35 (2006.01); C23C 14/50 (2006.01); C23C 16/458 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32642 (2013.01); C23C 14/3407 (2013.01); C23C 14/35 (2013.01); C23C 14/50 (2013.01); C23C 16/4585 (2013.01); H01J 37/32715 (2013.01); H01J 2237/20235 (2013.01); H01J 2237/332 (2013.01);
Abstract

Embodiments of process kits for use in a process chamber are provided herein. In some embodiments, a process kit for use in a process chamber includes: a deposition ring including a first portion having an first inner ledge and a second portion having a second inner ledge, wherein in a first position, the first portion is spaced from the second portion, and wherein in a second position, the second portion is configured to engage the first portion so that the first inner ledge is aligned with the second inner ledge along a common plane to form a clamping surface.


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