The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2010
Filed:
Mar. 07, 2005
Lawrence Chung-lai Lei, Milpitas, CA (US);
Siqing LU, San Jose, CA (US);
Steven E. Gianoulakis, Pleasanton, CA (US);
Won B. Bang, Santa Clara, CA (US);
David P. Sun, Mountain View, CA (US);
Yen-kun Victor Wang, Union City, CA (US);
Lawrence Chung-Lai Lei, Milpitas, CA (US);
Siqing Lu, San Jose, CA (US);
Steven E. Gianoulakis, Pleasanton, CA (US);
Won B. Bang, Santa Clara, CA (US);
David P. Sun, Mountain View, CA (US);
Yen-Kun Victor Wang, Union City, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Techniques of the present invention are directed to distribution of deposition gases onto a substrate. In one embodiment, a gas distributor for use in a processing chamber is provided. The gas distributor includes a body having a gas deflecting surface and a gas distributor face. The gas deflecting surface defines a cleaning gas pathway. The gas distributor face is disposed on an opposite side of the body from the gas deflecting surface and faces toward a substrate support member. The gas distributor face includes a raised step and at least one set of apertures through the raised step. The at least one set of apertures are adapted to distribute a deposition gas over a substrate positioned on the substrate support member.