The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2010
Filed:
Nov. 28, 2006
Soonam Park, Sunnyvale, CA (US);
Farhan Ahmad, Sunnyvale, CA (US);
Hemant P. Mungekar, San Jose, CA (US);
Sanjay Kamath, Fremont, CA (US);
Young S. Lee, San Jose, CA (US);
Siqing LU, San Jose, CA (US);
Soonam Park, Sunnyvale, CA (US);
Farhan Ahmad, Sunnyvale, CA (US);
Hemant P. Mungekar, San Jose, CA (US);
Sanjay Kamath, Fremont, CA (US);
Young S. Lee, San Jose, CA (US);
Siqing Lu, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Apparatus and methods for distributing gas in a semiconductor process chamber are provided. In an embodiment, a gas distributor for use in a gas processing chamber comprises a body. The body includes a baffle with a gas deflection surface to divert the flow of a gas from a first direction to a second direction. The gas deflection surface comprises a concave surface. The concave surface comprises at least about 75% of the surface area of the gas deflection surface. The concave surface substantially deflects the gas toward a chamber wall and provides decreased metal atom contamination from the baffle so that season times can be reduced.