San Gabriel, CA, United States of America

Sidney I Soclof

This inventor holds 25 USPTO granted patents, primarily in Lateral Transistors. Top assignee: Rockwell International Corporation. Active years: 1982-1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sidney I Soclof. Retrieved from https://idiyas.com/inventor/sidney-i-soclof

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 11

Forward Citations = 386(Granted Patents)


Location History:

  • San Gariel, CA (US) (1991)
  • San Gabriel, CA (US) (1982 - 1992)

Company Filing History:


Years Active: 1982-1992

Loading Chart...
Areas of Expertise:
NPN Transistor
PNP Transistor
Lateral Transistor
Silicon Vacuum Devices
High Value Resistor
Integrated Circuits
Optical Amplifier
Parasitic Capacitance
Substrate Separation
Electron Devices
Magneto-Transistor
25 patents (USPTO):Explore Patents

Title: Sidney I Soclof: Innovating Lateral Transistors for Rockwell International Corporation

Introduction:

Sidney I Soclof, a prolific inventor based in San Gabriel, CA, has made significant contributions to the field of electronics with his expertise in sub-micron dimensioned transistors. With a remarkable portfolio of 25 patents, Soclof's groundbreaking work, primarily in the development of complementary NPN and PNP lateral transistors, has garnered attention in the industry. This article sheds light on his latest patents, career highlights, collaborations, and his association with Rockwell International Corporation.

Latest Patents:

Soclof's recent patents demonstrate his mastery in creating high-performance complementary NPN and PNP lateral transistors, while effectively minimizing substrate interference.

1. Complementary NPN and PNP Lateral Transistors Separated from Substrate:

This invention involves the creation of a pair of complementary transistors in sub-micron dimensions on a selectively doped silicon substrate. By strategically forming intersecting slots and filling them with silicon oxide, Soclof ensures the separation of NPN and PNP transistor regions from the substrate. This innovation allows for efficient electrical interconnections and complete isolation of the active regions, achieving exceptional performance.

2. PNP-Type Lateral Transistor with Minimal Substrate Operation Interference:

Soclof's second patent introduces a unique PNP-type transistor design that permits the fabrication of hundreds of these transistors on a single chip. The active regions of these transistors are surrounded by field oxide, completely isolating them from substrate effects. Orthogonal slots are utilized to enable controlled doping and access to specific sides of the active regions, resulting in reduced parasitic capacitances and resistances. This innovation significantly enhances transistor performance and overall circuit efficiency.

Career Highlights:

Sidney I Soclof has spent a substantial part of his career at Rockwell International Corporation, a renowned technology company specializing in aerospace and defense. His noteworthy contributions in lateral transistor design have earned him recognition within Rockwell and the broader electronics industry.

Collaborations:

One of Soclof's notable collaborators is Michael T Elliott, who is likely a fellow engineer or researcher at Rockwell International Corporation. The extent of their collaboration and specific joint projects are not disclosed in the provided information.

Conclusion:

Sidney I Soclof's expertise in complementary NPN and PNP lateral transistor design, as evident from his extensive patent portfolio, showcases his innovative contributions to the field of electronics. His novel approaches to sub-micron transistor dimensions and the effective isolation of active regions have undoubtedly advanced transistor performance and efficiency. Soclof's affiliation with Rockwell International Corporation further highlights the practical application and industry impact of his inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…