Shun-Li Lin

Title: Shun-Li Lin: Innovator in Photolithography

Introduction

Shun-Li Lin is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of photolithography, holding a total of 10 patents. His work focuses on improving the efficiency and accuracy of lithographic processes, which are crucial in semiconductor manufacturing.

Latest Patents

One of his latest patents is titled "Structure applied to a photolithographic process." This invention provides a structure that includes a film layer, an optical isolation layer, an anti-reflection coating, and a photoresist layer, all sequentially formed over a substrate. The optical isolation layer prevents light from penetrating down to the film layer, ensuring that the critical dimensions of the photolithographic process remain unaffected by changes in the film layer's thickness. Another notable patent is the "Method for analyzing overlay errors." This method involves interfield and intrafield sampling to measure overlay error values at multiple positions on wafers. The overlay error model incorporates various coefficients to fit the measured values, addressing both intrafield and interfield overlay errors.

Career Highlights

Shun-Li Lin is currently employed at Macronix International Co., Ltd., where he continues to innovate in the field of lithography. His expertise has led to advancements that enhance the precision of semiconductor fabrication processes.

Collaborations

Throughout his career, Shun-Li Lin has collaborated with notable colleagues, including Chen-Fu Chien and Wei-Hua Hsu. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Shun-Li Lin's contributions to photolithography have made a significant impact on the semiconductor industry. His innovative patents and collaborative efforts continue to drive advancements in this critical field.