Tokyo, Japan

Shuji Asai


Average Co-Inventor Count = 1.2

ph-index = 3

Forward Citations = 52(Granted Patents)


Company Filing History:


Years Active: 1980-2002

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9 patents (USPTO):Explore Patents

Title: **Inventor Shuji Asai: Pioneering Innovations in Semiconductor Technology**

Introduction

Shuji Asai, a distinguished inventor based in Tokyo, Japan, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of 9 patents, he continues to shape the landscape of modern electronics through his innovative approaches and solutions. His work focuses on enhancing semiconductor devices and methodologies to improve performance and reliability.

Latest Patents

Among his latest patents, two stand out for their transformative potential in semiconductor manufacturing. The first patent describes a **semiconductor device and method for manufacturing the same**, which involves creating semiconductor elements on the substrate's front surface protected by an insulating film. A notable feature of this invention is an opening that penetrates the substrate, allowing for the formation of a buried wiring line, which improves the overall connectivity of the device. The internal space of the wiring line is filled with a resin film, enhancing the integrity of the component.

The second patent is a **compound semiconductor device having an ion implanted defect-rich layer for improved backgate effect suppression**. This innovative design improves backgate voltage resistance by implanting boron ions on the substrate's rear surface, which forms a defect-rich layer. This layer effectively enhances the performance of field-effect transistors and ensures higher reliability in field applications.

Career Highlights

Shuji Asai's career has been marked by valuable experiences at leading companies in the industry. His tenure at NEC Corporation and Nippon Electric Co., Ltd. has not only shaped his expertise but also positioned him as a leading figure in semiconductor innovation. Asai's advancements in manufacturing techniques and device structures have received recognition in the engineering community, further solidifying his reputation as an industry pioneer.

Collaborations

Throughout his career, Shuji Asai has collaborated with eminent professionals, including Michihisa Kohno and Hirokazu Oikawa. These partnerships have led to significant breakthroughs in semiconductor technology, showcasing the power of teamwork in driving innovation. Their combined expertise has facilitated advancements that have practical applications across various electronic devices.

Conclusion

In conclusion, Shuji Asai's contributions to semiconductor technology are immensely valuable. His latest patents reflect a focus on enhancing device performance and efficiency, which aligns with the increasing demands of modern electronic applications. Asai's career and collaborations with other esteemed professionals highlight the importance of innovation and teamwork in the realm of engineering. His work will undoubtedly continue to influence the future of semiconductor technology for years to come.

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